Functional Device Engineering Laboratory / Kyushu University

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1F Cleanroom 1

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Thin film fabrication systems

ECR sputtering system

Atomic Layer Deposition (ALD) system

Ultra high vaccum sputtering system

magnetron sputtering system

magnetron sputtering system (3 targets)

Al thermal evaporation system

Electon beam evaporation system
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Annealing system

Rapid thermal annealing (RTA) system

Furnaces for oxidation and annealing

Furnace for wet oxidation and diffusion

Furnace for high temperature annealing
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Others

Mask aligner (Mikasa Co. Ltd.)

Mask aligner (DNP Co. Ltd.)

Reactive ion etching system

Clean bench

Elipsometory

Optical microscope

Plasma reactor
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LANGUAGE

  • Japanese
  • English
  • OI Bldg.
  • cleanroom 1
  • equipment room 1
  • D-bldg.IGSES. the second-floor 205.
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